Atomic Layer Deposition

Atomic Layer Deposition
sku: 34443056
20,860.00 руб.+11%
23,153.29 руб.
Shipping from: Russia
   Description
Since the first edition was published in 2008, Atomic Layer Deposition (ALD) has emerged as a powerful, and sometimes preferred, deposition technology. The new edition of this groundbreaking monograph is the first text to review the subject of ALD comprehensively from a practical perspective. It covers ALD's application to microelectronics (MEMS) and nanotechnology; many important new and emerging applications; thermal processes for ALD growth of nanometer thick films of semiconductors, oxides, metals and nitrides; and the formation of organic and hybrid materials.
   Technical Details
age: 0
author: Marja-Leena K??ri?inen
genres_list: 5671
ISBN: 9781118747421
lang: en
publisher: John Wiley & Sons Limited
Type: book
Форматы: PDF
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